• Higher current efficiency and more smoother deposit structure.
• Excellent cathode efficiency and improved thickness distribution.
• Good deposit hardness with microcracked deposit.
• Higher and denser crack count at wide range of current densities.
• Process can be used at higher current density to achieve higher productivity.
• PFOS free wetting agent for Chrome plating solutions.
• Excellent to control surface tension of chromo-sulphuric acid etching for plating on plastics application/
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